@inproceedings{DATE21_GPU_LevelSet,
  author    = {Yu, Ziyang and Chen, Guojin and Ma, Yuzhe and Yu, Bei},
  booktitle = {2021 Design, Automation & Test in Europe Conference & Exhibition (DATE)},
  title     = {A GPU-enabled Level Set Method for Mask Optimization},
  year      = {2021},
  pages     = {1835-1838},
  doi       = {10.23919/DATE51398.2021.9474212}
}


@inproceedings{ICCAD20_DAMO,
  author    = {Chen, Guojin and Chen, Wanli and Ma, Yuzhe and Yang, Haoyu and Yu, Bei},
  title     = {{DAMO}: Deep Agile Mask Optimization for Full Chip Scale},
  year      = {2020},
  url       = {https://doi.org/10.1145/3400302.3415705},
  doi       = {10.1145/3400302.3415705},
  booktitle = {Proceedings of the 39th International Conference on Computer-Aided Design}
}


@inproceedings{ISPD21_Pointcloud,
  author    = {Li, Wei and Chen, Guojin and Yang, Haoyu and Chen, Ran and Yu, Bei},
  title     = {Learning Point Clouds in EDA},
  year      = {2021},
  isbn      = {9781450383004},
  url       = {https://doi.org/10.1145/3439706.3446895},
  doi       = {10.1145/3439706.3446895},
  booktitle = {Proceedings of the 2021 International Symposium on Physical Design}
}


@inproceedings{ICCAD21_DevelSet,
  author    = {Chen, Guojin and Yu, Ziyang and Liu, Hongduo and Ma, Yuzhe and Yu, Bei},
  title     = {{DevelSet}: Deep Neural Level Set for Instant Mask Optimization},
  year      = {2021},
  url       = {https://doi.org/10.1109/ICCAD51958.2021.9643464},
  doi       = {10.1109/ICCAD51958.2021.9643464},
  booktitle = {2021 IEEE/ACM International Conference On Computer Aided Design (ICCAD)}
}


@inproceedings{ICCAD22_LayoutTransformer,
  author    = {Wen, Liangjian and Zhu, Yi and Ye, Lei and Chen, Guojin and Yu, Bei and Liu, Jianzhuang and Xu, Chunjing},
  title     = {{LayouTransformer}: Generating Layout Patterns with Transformer via Sequential Pattern Modeling},
  year      = {2022},
  isbn      = {9781450392174},
  url       = {https://doi.org/10.1145/3508352.3549350},
  doi       = {10.1145/3508352.3549350},
  booktitle = {Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design}
}

@inproceedings{ICCAD22_AdaOPC,
  author    = {Zhao, Wenqian and Yao, Xufeng and Yu, Ziyang and Chen, Guojin and Ma, Yuzhe and Yu, Bei and Wong, Martin D. F.},
  title     = {{AdaOPC}: A Self-Adaptive Mask Optimization Framework for Real Design Patterns},
  year      = {2022},
  isbn      = {9781450392174},
  url       = {https://doi.org/10.1145/3508352.3549468},
  doi       = {10.1145/3508352.3549468},
  booktitle = {Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design}
}


@inproceedings{ECCV22_hilbert,
  author    = {Chen, Wanli and Zhu, Xinge and Chen, Guojin and Yu, Bei},
  title     = {Efficient Point Cloud Analysis Using Hilbert Curve},
  year      = {2022},
  url       = {https://doi.org/10.1007/978-3-031-20086-1_42},
  doi       = {10.1007/978-3-031-20086-1_42},
  booktitle = {ECCV 2022: 17th European Conference, Tel Aviv, Israel, October 23–27, 2022, Proceedings, Part II}
}



@misc{OPC_OpenILT,
  author       = {Zheng, Su and Ma, Yuzhe and Zhu, Binwu and Chen,Guojin and Zhao, Wenqian and Yin, Shuo and Yu, Ziyang and Yu, Bei},
  title        = {{OpenILT}: An Open-source Platform for Inverse Lithography Technique Research},
  year         = {2023},
  publisher    = {GitHub},
  journal      = {GitHub repository},
  howpublished = {\url{https://github.com/OpenOPC/OpenILT/}}
}


@inproceedings{SPIE23_GPU_MPL,
  author       = {Chen, Guojin and Yang, Haoyu and Yu, Bei},
  title        = {{GPU-accelerated matrix cover algorithm for multiple patterning layout decomposition}},
  booktitle    = {DTCO and Computational Patterning II},
  organization = {International Society for Optics and Photonics},
  publisher    = {SPIE},
  year         = {2023},
  doi          = {10.1117/12.2657904},
  url          = {https://doi.org/10.1117/12.2657904}
}

@inproceedings{SPIE24_difflitho,
  title        = {Open-Source Differentiable Lithography Imaging Framework},
  author       = {Chen, Guojin and Geng, Hao and Yu, Bei and Pan, David Z.},
  booktitle    = {SPIE, Advanced Lithography + Patterning},
  organization = {International Society for Optics and Photonics},
  publisher    = {SPIE},
  year         = {2024},
  month        = {3}
}



@inproceedings{DAC23_DiffPattern,
  title     = {{DiffPattern}: Layout Pattern Generation via Discrete Diffusion},
  author    = {Wang, Zixiao and Shen, Yunheng and Zhao, Wenqian and Bai, Yang and Chen, Guojin and Farnia, Farzan and Yu, Bei},
  booktitle = {ACM/IEEE Design Automation Conference (DAC)},
  year      = {2023}
}


@inproceedings{DAC23_Nitho,
  title        = {Physics-informed optical kernel regression using complex-valued neural fields},
  author       = {Chen, Guojin and Pei, Zehua and Yang, Haoyu and Ma, Yuzhe and Yu, Bei and Wong, Martin},
  booktitle    = {2023 60th ACM/IEEE Design Automation Conference (DAC)},
  pages        = {1--6},
  year         = {2023},
  organization = {IEEE}
}


@inproceedings{ICCAD23:AlphaSyn,
  author    = {Pei, Zehua and Liu, Fangzhou and He, Zhuolun and Chen, Guojin and Zheng, Haisheng and Zhu, Keren and Yu, Bei},
  booktitle = {2023 IEEE/ACM International Conference on Computer Aided Design (ICCAD)},
  title     = {{AlphaSyn}: Logic Synthesis Optimization with Efficient Monte Carlo Tree Search},
  year      = {2023},
  pages     = {1-9},
  doi       = {10.1109/ICCAD57390.2023.10323856}
}


@inproceedings{DAC24_BiSMO,
  title     = {Efficient Bilevel Source Mask Optimization},
  author    = {Chen, Guojin and He, Hongquan and Xu, Peng and Geng, Hao and Yu, Bei},
  booktitle = {2024 61th ACM/IEEE Design Automation Conference (DAC)},
  pages     = {1-6},
  year      = {2024},
  month     = {7},
  organization = {IEEE},
}


% =====================================================================
%                            Journal papers
% =====================================================================

@article{TCAD22_DAMO,
  author  = {Chen, Guojin and Chen, Wanli and Sun, Qi and Ma, Yuzhe and Yang, Haoyu and Yu, Bei},
  journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems},
  title   = {{DAMO}: Deep Agile Mask Optimization for Full-Chip Scale},
  year    = {2022},
  volume  = {41},
  number  = {9},
  pages   = {3118-3131},
  doi     = {10.1109/TCAD.2021.3116511}
}

@article{TCAD_DevelSet,
  author  = {Chen, Guojin and Yu, Ziyang and Liu, Hongduo and Ma, Yuzhe and Yu, Bei},
  journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems},
  title   = {{DevelSet}: Deep Neural Level Set for Instant Mask Optimization},
  year    = {2023},
  doi     = {10.1109/TCAD.2023.3286262}
}


@article{TCAD_GPU_LevelSet,
  author  = {Yu, Ziyang and Chen, Guojin and Ma, Yuzhe and Yu, Bei},
  journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems},
  title   = {A GPU-Enabled Level-Set Method for Mask Optimization},
  year    = {2023},
  volume  = {42},
  number  = {2},
  pages   = {594-605},
  doi     = {10.1109/TCAD.2022.3175939}
}

@article{L2OILT_TCAD,
  author  = {Zhu, Binwu and Zheng, Su and Yu, Ziyang and Chen, Guojin and Ma, Yuzhe and Yang, Fan and Yu, Bei and Wong, Martin},
  journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems},
  title   = {L2O-ILT: Learning to Optimize Inverse Lithography Techniques},
  year    = {2023},
  month   = {09}
}


@article{TCAD_DiffSMO,
  author  = {Chen, Guojin and Wang, Zixiao and Yu, Bei and Pan, David Z. and Wong, Martin D.F.},
  journal = {IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems},
  title   = {Ultra-Fast Source Mask Optimization via Conditional Discrete Diffusion},
  year    = {2024},
  pages   = {1-1},
  doi     = {10.1109/TCAD.2024.3361400}
}




